|Pulse duration (I FWHM)||45||fs|
|Max energy on target||10||J|
|Shot energy stability||2||%||r.m.s.|
|Focal spot at target|
|ps scale||10-12||@ >25 ps|
Advanced Beam Laboratory
The ALEPH laser system will be made available with the same characteristics as offered in Run 1. Approximately four experiments of 2-3 week duration will be supported in 2020. Scheduling will be flexible.
Colorado State University Petawatt-Class Laser is an ultra-short pulse Ti:sapphire laser system that produces ultrahigh-contrast λ = 400 nm femtosecond pulses of up to 10 J, obtained by frequency doubling 800 nm pulses of 30 fs duration. An intensity of 6.5x1021 W/cm2 is obtained focusing the beam with an f/2 parabola. An f/1 parabola will be available after July 2019 that is expected to deliver intensities >1×1022. The beam/pulse parameters presently offered by the laser are summarized in the Laser Modes table.
A schematic diagram of the laser is shown in Figure 1. It consists ofa conventional Ti:Sa front end that delivers λ=800 nm pulses into a chain of three high power Ti:Sa amplification stages pumped by Nd:YAG slab amplifiers. The 250 mJ output of this laser front end is further amplified in three multi-pass Ti:Sa amplifiers pumped by the frequency doubled output of eight compact flash lamp-pumped high energy Nd:glass slab amplifiers, developed at CSU. The slab geometry has long been recognized as a way to significantly reduce the limitations in repetition rate inherent to the more commonly used rod geometry. These pump laser allows Ti:sappire system operation at a repetition rate of up to 3.3 Hz in burst mode. The beam propagates in a zig-zag path in the gain medium aided by total internal reflection in the polished wall of the slabs eliminating first-order thermal and stress-induced focusing, and also reducing stress-induced birefringence.
Each slab amplifier generates pulses with ~18 J energy and 15 ns duration at 1053 nm. The rms pulse energy fluctuation for 1053nm slab pump laser is ~1%. The amplified beams are frequency doubled by LBO crystals to generate 11 J pulses at 527 nm. The eight slab amplifier arms produce a total 527 nm pump energy of 88 J, with a uniform nearly flat-top beam profile this is used to pump the three main Ti:Sa amplifiers. The amplifier chain generates 800 nm pulses of up to 37 J energy before compression. A gold grating compressor compresses these pulses into pulses of up to 26 J energy with duration as shot as 30 fs. These pulses are frequency doubled to generate the ultrahigh contrast 400 nm pulses that constitute the normal mode of operation.
The facility includes a target chamber 1.2m in diameter shown in Figure 2. There are NW 200 and NW 100 located on the equator. A motorized target holder system designed to hold numerous targets and an accurate target positioning system are available. A Solid Works™ generated parasolidmodel of the target chamber can be downloaded here.
Plasma Diagnostics instrumentation
A suite of plasma diagnostics instrumentation is available. These include:
- Von Hamos crystal spectrometer operating with a 4cm radius of curvature mica crystal covering the 7 keV to 13 keV spectral region
- Filtered silicon photodiode array; filters are available with cut-off between 1 keV and 15 keV
- Step wedge spectrometer
- Thomson parabola spectrometer with MCP/CCD detector
- Array of four scintillator/photomultiplier neutron detectors
- Bubble detectors
Jorge Rocca, email@example.com
ALEPH 400 nm
ALEPH 800 nm
|Pulse duration (I FWHM)||30||fs|
|Max energy on target||26||J|
|Shot energy stability||1.7||%||r.m.s.|
|Focal spot at target|
|ps scale||5x10-6||@ > 25 ps|
|Repetition Rate||3.3||Hz||burst mode|